Modeling and control of microelectronics materials processing

Description of DASSL: a differential/algebraic system solver

Linda Petzold · University of North Texas Digital Library (University of North Texas) · 1982 · 965 citations · Full text

Natural Sciences, Mathematics, Physics +11

Optical emission spectroscopy of reactive plasmas: A method for correlating emission intensities to reactive particle density

J. W. Coburn, Min Chen · Journal of Applied Physics · 1980 · 880 citations

Natural Sciences, Physics, Optics +16

<i>Glow Discharge Processes: Sputtering and Plasma Etching</i>

B. N. Chapman, J. L. Vossen · Physics Today · 1981 · 544 citations

Natural Sciences, Electrical Engineering, Physics +16

A Mathematical Model of the Coupled Fluid Mechanics and Chemical Kinetics in a Chemical Vapor Deposition Reactor

Michael E. Coltrin, Robert J. Kee, James A. Miller · Journal of The Electrochemical Society · 1984 · 342 citations

Natural Sciences, Chemical Engineering, Chemistry +17

Orthogonal collocation on finite elements

Graham F. Carey, Bruce A. Finlayson · Chemical Engineering Science · 1975 · 328 citations

Computing, Computational Engineering, Mathematics +11