Anthony J. Toprac

Just-in-Time Adaptive Disturbance Estimation for Run-to-Run Control of Semiconductor Processes

Stacy Firth, W.J. Campbell, Anthony J. Toprac et al. · IEEE Transactions on Semiconductor Manufacturing · 2006 · 75 citations

Control Method, Semiconductor Processes, Engineering +15

Plasma etching endpoint detection using multiple wavelengths for small open-area wafers

Heng Yue, S. Joe Qin, Joseph Wiseman et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2001 · 66 citations

Optical Materials, Engineering, Electron-beam Lithography +22

A comparison of run-to-run control algorithms

W.J. Campbell, Stacy Firth, Anthony J. Toprac et al. · 2002 · 63 citations

Engineering, Industrial Engineering, Systems Engineering +19

Modeling and control of microelectronics materials processing

Thomas A. Badgwell, T. Breedijk, Scott Bushman et al. · Computers & Chemical Engineering · 1995 · 47 citations

Materials Science, Engineering, Material Processing +3

Limestone dissolution in stack gas desulfurization. A mass‐transfer model is shown to predict the the measured dissolution rates with less than 30% error

Anthony J. Toprac, Gary T. Rochelle · Environmental Progress · 1982 · 43 citations

Chemical Engineering, Engineering, Measured Dissolution Rates +10