Mechanical properties of silicon oxynitride thin films prepared by low energy ion beam assisted deposition

The tension of metallic films deposited by electrolysis

G. Stoney · Proceedings of the Royal Society of London Series A Containing Papers of a Mathematical and Physical Character · 1909 · 4.8K citations · Full text

Natural Sciences, Chemistry, Materials Science +11

Calculated elastic constants for stress problems associated with semiconductor devices

William A. Brantley · Journal of Applied Physics · 1973 · 1.2K citations

Natural Sciences, Materials Engineering, Materials Science +17

Formation of Cubic Boron Nitride Films by Boron Evaporation and Nitrogen Ion Beam Bombardment

Mamoru Satou, F. Fujimoto · Japanese Journal of Applied Physics · 1983 · 158 citations

Natural Sciences, Materials Engineering, Materials Science +8

Furnace nitridation of thermal SiO/sub 2/ in pure N/sub 2/O ambient for ULSI MOS applications

Jinho Ahn, W. Ting, Dim‐Lee Kwong · IEEE Electron Device Letters · 1992 · 113 citations

Engineering, Electrical Engineering, Materials Science +17

Relative roles of ion energy, ion flux, and sample temperature in low-energy nitrogen ion implantation of FeCrNi stainless steel

D. L. Williamson, J.A. Davis, Paul J. Wilbur et al. · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 1997 · 102 citations

Engineering, Materials Engineering, Materials Science +10