Thin Solid Films · 1975 · 118 citations · 9 references
Materials ScienceLow TemperaturesEngineeringSurface ScienceApplied PhysicsSiliceneThin FilmsThin Film Processing
9
Max Hansen, K. Anderko, H. W. Salzberg · Journal of The Electrochemical Society · 1958 · 14.8K citations
Implanted noble gas atoms as diffusion markers in silicide formation
Wei Chu, S.S. Lau, J. W. Mayer et al. · Thin Solid Films · 1975 · 266 citations
Structure and growth kinetics of Ni2Si on silicon
K. N. Tu, Wei Chu, J. W. Mayer · Thin Solid Films · 1975 · 212 citations