Profile evolution during thermal nanoimprint

Imprint of sub-25 nm vias and trenches in polymers

Stephen Y. Chou, Peter R. Krauss, Preston J. Renstrom · Applied Physics Letters · 1995 · 2.7K citations

Engineering, Manufacturing Engineering, Materials Science +15

Flow behaviour of thin polymer films used for hot embossing lithography

Laura J. Heyderman, Helmut Schift, Christian Dávid et al. · Microelectronic Engineering · 2000 · 351 citations

Natural Sciences, Materials Engineering, Materials Science +15

Simulation and experimental study of polymer deformation in nanoimprint lithography

Yoshihiko Hirai, Takaaki Konishi, Takashi Yoshikawa et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2004 · 173 citations

Engineering, Materials Engineering, Materials Science +17

Impact of molecular weight of polymers and shear rate effects for nanoimprint lithography

H. Schulz, M. Wissen, N. Bogdanski et al. · Microelectronic Engineering · 2005 · 61 citations

Natural Sciences, Materials Engineering, Materials Science +16

Polymer time constants during low temperature nanoimprint lithography

Hella‐Christin Scheer, N. Bogdanski, M. Wissen et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2005 · 38 citations

Engineering, Materials Engineering, Materials Science +17