Publication | Closed Access
Assessing the performance of two-dimensional dopant profiling techniques
67
Citations
12
References
2004
Year
EngineeringElectron-beam LithographyMicroscopyMeasurementEducationProfiling TechniqueElectron MicroscopyData MiningInstrumentationStatisticsStaircase Calibration SamplesElectrical EngineeringProfiling ToolBipolar TransistorMicroanalysisMicroelectronics2D-profiling ToolsPerformance MonitoringApplied PhysicsElectronic Instrumentation
This article discusses the results obtained from an extensive comparison set up between nine different European laboratories using different two-dimensional (2D) dopant profiling techniques (SCM, SSRM, KPFM, SEM, and electron holography). This study was done within the framework of a European project (HERCULAS), which is focused on the improvement of 2D-profiling tools. Different structures (staircase calibration samples, bipolar transistor, junctions) were used. By comparing the results for the different techniques, more insight is achieved into their strong and weak points and progress is made for each of these techniques concerning sample preparation, dynamic range, junction delineation, modeling, and quantification. Similar results were achieved for similar techniques. However, when comparing the results achieved with different techniques differences are noted.
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