Inactivation of <i>Escherichia coli</i> O157:H7 on Inoculated Alfalfa Seeds with Pulsed Ultraviolet Light and Response Surface Modeling

Abstract

ABSTRACT : Escherichia coli O157:H7‐inoculated alfalfa seeds with seed layer thicknesses of 1.02 to 6.25 mm were subjected to pulsed UV light for up to 90 s at a 8‐cm distance from the UV strobe. Population reductions higher than 4 log 10 colony‐forming units (CFU)/g were achieved. For effect of distance from the UV strobe, seeds with 6.25‐mm layer thickness were treated 3 to 13 cm from the strobe. Reductions at shorter distances, such as 60 s at 5 cm (1.93 log 10 CFU/g) and 60 to 90 s at 8 cm (4.89 log 10 CFU/g), were significantly higher ( P ≤ 0.05). Data from the treatments were used to develop empirical models as a function of distance or layer thickness and treatment time for predicting the population of E. coli O157:H7 during pulsed UV‐light treatment. This study demonstrates that pulsed UV light holds promise for eliminating pathogens from alfalfa seeds, and the models developed can be useful predictive tools.