Etching of SiC with Fluorine ECR Plasma

Monocrystalline silicon carbide nanoelectromechanical systems

Ya‐Tang Yang, K. L. Ekinci, Xuefei Huang et al. · Applied Physics Letters · 2001 · 287 citations · Full text

Engineering, Materials Engineering, Materials Science +17

Microwave Plasma Etching

Keizô Suzuki, Sadayuki Okudaira, N. Sakudo et al. · Japanese Journal of Applied Physics · 1977 · 236 citations

Engineering, Materials Engineering, Physics +13

Radiation damage in silicon (001) due to low energy (60–510 eV) argon ion bombardment

A. Al-Bayati, Kevin Orrman-Rossiter, R. Badheka et al. · Surface Science · 1990 · 57 citations

Engineering, Materials Science, Physics +13

Chemical Etching of Silicon Carbide with Hydrogen

T. L. Chu, R. B. Campbell · Journal of The Electrochemical Society · 1965 · 57 citations

Engineering, Materials Engineering, Materials Science +14

Gaseous etching of 6H–SiC at relatively low temperatures

Zihao Xie, C. H. Wei, L.Y Li et al. · Journal of Crystal Growth · 2000 · 45 citations

Engineering, Materials Engineering, Materials Science +16