Etching of SiC with Fluorine ECR Plasma - Concepedia

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Etching of SiC with Fluorine ECR Plasma

13

Citations

6

References

2004

Year

Christian Förster, V. Cimalla, Ratislav Kosiba, G. Ecke, Petia Weih, O. Ambacher, Joerg Pezoldt

Materials science forum

Materials ScienceMaterials EngineeringEngineeringMicrofabricationApplied PhysicsFluorine Ecr PlasmaGas Discharge PlasmaMicroelectronicsPlasma EtchingPlasma Processing

References

	Year	Citations

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