Three-dimensional multilayered microstructure fabricated by imprint lithography

Hiroaki Ooe, Masatoshi Morimatsu, Takashi Yoshikawa, Hiroaki Kawata, Yoshihiko Hirai

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2005 · 25 citations · 6 references

Concepts

Abstract

The fabrication of a three-dimensional multilayered microstructure is demonstrated by the imprint and reversal imprint technique. We have studied polymer properties and pressing conditions as important parameters for selecting the reversal imprint modes. We investigated the conditions that are required to form the fluid channels and the through holes. Using these advanced processes, three-dimensional microfluid channels with through holes were successfully fabricated at low cost and high throughput. This technique is one of the most promising methods for making various advanced microstructures such as compact and multifunctional chemical devices.

References

6