Concepedia

Fabrication of three-dimensional nanoimprint mold using inorganic resist in low accelerating voltage electron beam lithography

Yoshiaki Ishii, Jun Taniguchi

Microelectronic Engineering · 2007 · 37 citations · 3 references

DOI

Concepts

References

3

Imprint of sub-25 nm vias and trenches in polymers

Stephen Y. Chou, Peter R. Krauss, Preston J. Renstrom · Applied Physics Letters · 1995 · 2.7K citations

, , +15

Low voltage electron beam lithography in PMMA

A. Olkhovets, H. G. Craighead · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 44 citations

, , +17

3D imprint technology using substrate voltage change

Jun Taniguchi, Masamichi Iida, T Miyazawa et al. · Applied Surface Science · 2004 · 30 citations

, , +9