Microelectronic Engineering · 2001 · 10 citations · 4 references
ComputingComputational EngineeringComputer EngineeringComputational ElectromagneticsComputational PhysicsScientific ComputingComputational ModelingDevice SimulationElectron Beam LithographyMonte Carlo MethodsMonte Carlo SimulationSimulation MethodsComputational LithographyFabrication Process SimulationFocused Ion Beam LithographyMonte Carlo EnsemblesMonte Carlo EstimationMonte Carlo Simulation Of Light Propagation
4
Scattering with angular limitation projection electron beam lithography for suboptical lithography
L. R. Harriott · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1997 · 105 citations
Engineering, Manufacturing Engineering, Materials Science +10
Projection reduction exposure with variable axis immersion lenses: Next generation lithography
H. C. Pfeiffer, R. S. Dhaliwal, S. D. Golladay et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 61 citations
Natural Sciences, Manufacturing Engineering, Biomedical Optics +11
Distributed, multiple variable shaped electron beam column for high throughput maskless lithography
Trish Groves, Rodney Kendall · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 49 citations
Engineering, Electrical Engineering, Manufacturing Engineering +10