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Self-aligned SiGe NPN transistors with 285 GHz f/sub MAX/ and 207 GHz f/sub T/ in a manufacturable technology
261
Citations
11
References
2002
Year
Ghz F/sub Max/EngineeringSemiconductor DeviceSige Npn HbtsRf SemiconductorNanoelectronicsElectronic EngineeringGhz F/sub T/Manufacturable TechnologySmaller TransistorsElectronic CircuitElectrical EngineeringPhysicsHigh-frequency DeviceSemiconductor Device FabricationMaximum Available GainMillimeter Wave TechnologyMicroelectronicsMicrowave EngineeringApplied Physics
This paper reports on SiGe NPN HBTs with unity gain cutoff frequency (f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">T</sub> ) of 207 GHz and an f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">max</sub> extrapolated from Mason's unilateral gain of 285 GHz. f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">max</sub> extrapolated from maximum available gain is 194 GHz. Transistors sized 0.12×2.5 μm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> have these characteristics at a linear current of 1.0 mA/μm (8.3 mA/μm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> ). Smaller transistors (0.12×0.5 μm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> ) have an f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">T</sub> of 180 GHz at 800 μA current. The devices have a pinched base sheet resistance of 2.5 k/spl Omega//sq. and an open-base breakdown voltage BV/sub CEO/ of 1.7 V. The improved performance is a result of a new self-aligned device structure that minimizes parasitic resistance and capacitance without affecting f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">T</sub> at small lateral dimensions.
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