An investigation of RF sputter etched silicon surfaces using helium ion backscatter

Positive-ion bombardment of substrates in rf diode glow discharge sputtering

J. W. Coburn, E. Kay · Journal of Applied Physics · 1972 · 421 citations

Natural Sciences, Electrical Engineering, Physics +13

Ion Energies at the Cathode of a Glow Discharge

William D. Davis, T. A. Vanderslice · Physical Review · 1963 · 378 citations

Natural Sciences, Physics, Analytical Chemistry +10

Defect studies in crystals by means of channeling

E. Bøgh · Canadian Journal of Physics · 1968 · 364 citations

Natural Sciences, Materials Science, Physics +16

Principles and applications of ion beam techniques for the analysis of solids and thin films

J. W. Mayer, M‐A. Nicolet, T.M. Buck et al. · Thin Solid Films · 1973 · 332 citations

Natural Sciences, Materials Science, Physics +12

ION IMPLANTATION OF SILICON: I. ATOM LOCATION AND LATTICE DISORDER BY MEANS OF 1.0-MeV HELIUM ION SCATTERING

John Davies, J. Denhartog, L. Eriksson et al. · Canadian Journal of Physics · 1967 · 274 citations

Engineering, Materials Engineering, Materials Science +17