Concepedia

Publication | Closed Access

Tantalum carbide and nitride diffusion barriers for Cu metallisation

DOI

52

Citations

8

References

2002

Year

Tomi Laurila, Ke Zeng, J.K. Kivilahti, J. M. Molarius, Tommi Riekkinen, I. Suni
Microelectronic Engineering

References

YearCitations

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