Surface Diffusion Barriers

Surface Diffusion Barriers is the minimum energy barrier that an adsorbed atom or molecule must overcome to migrate across a semiconductor surface, distinguishing it from other surface energy phenomena by specifically governing the kinetics and pathways of surface diffusion processes.

1K

Publications

50.5K

Citations

3.3K

Authors

825

Institutions

Publications per year

2017–2026

137

Variants

Surface Diffusion Activation Energies

Authors

3.3K

  1. JK
    Jörg Kärger

    Leipzig University, Germany

    16 publications · 1K citations

    16

    h-index

  2. EK
    E. Kolawa

    California Institute of Technology, United States

    12 publications · 823 citations

    12

    h-index

  3. PJ
    Peter J. Feibelman

    Sandia National Laboratories, United States

    11 publications · 1K citations

    11

    h-index

  4. MS
    Matthias Scheffler

    Fritz Haber Institute of the Max Planck Society, Germany

    9 publications · 1.6K citations

    9

    h-index

  5. JW
    James W. Evans

    Iowa State University, United States

    8 publications · 152 citations

    8

    h-index

1–5 of 3.3K

Venues

  1. Physical Review Letters

    PRL · 58 publications · 5.9K citations

    41

    h-index

  2. Physical review. B, Condensed matter

    PRB · 71 publications · 4.1K citations

    36

    h-index

  3. The Journal of Chemical Physics

    62 publications · 3.3K citations

    30

    h-index

  4. The Journal of Physical Chemistry C

    58 publications · 3K citations

    29

    h-index

  5. Thin Solid Films

    55 publications · 2.4K citations

    28

    h-index

1–5