Karen Holloway - Concepedia

Concepedia

Author

Karen Holloway

Stanford University

Also Known As

K. L. Holloway, K.L. Holloway, Karen Holloway

19

Publications

1.3K

Citations

9

H-Index

18

Concepts

All Affiliations

Stanford University IBM Research - Thomas J. Watson Research Center

KH

About

Karen Holloway is an author at Stanford University specializing in applied physics, materials science, and engineering.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	9	9	1.3K
2	Applied Physics	9	9	1.3K
3	Materials Engineering	5	5	958
4	Chemistry	3	3	665
5	Chemical Engineering	1	1	39

Karen Holloway

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9

Publications

1.3K

Citations

9

H-Index

	Year	Citations
Tantalum as a diffusion barrier between copper and silicon: Failure mechanism and effect of nitrogen additions Karen Holloway, P. M. Fryer, C. Cabral, Journal of Applied Physics EngineeringChemistryChemical DepositionNitrogen AdditionsNitrogen Alloy	1992	445
Tantalum as a diffusion barrier between copper and silicon Karen Holloway, P. M. Fryer Applied Physics Letters Materials EngineeringMaterials ScienceThin Tantalum LayersEngineeringDiffusion Resistance	1990	261
Amorphous Ti-Si alloy formed by interdiffusion of amorphous Si and crystalline Ti multilayers Karen Holloway, Robert Sinclair Journal of Applied Physics EngineeringThin Film Process TechnologySilicon On InsulatorAmorphous MaterialsSputtered Ti-si Multilayers	1987	228
Interfacial reactions on annealing molybdenum-silicon multilayers Karen Holloway, Khiem Ba, Robert Sinclair Journal of Applied Physics Interfacial ReactionsEngineeringSputtered Mo-si MultilayersElectron DiffractionChemistry	1989	159
High-resolution and in situ tem studies of annealing of Ti-Si multilayers Karen Holloway, Robert Sinclair Journal of the Less Common Metals Materials ScienceEngineeringSurface ScienceApplied PhysicsTi-si Multilayers	1988	68
Amorphous silicide formation by thermal reaction: A comparison of several metal–silicon systems Karen Holloway, Robert Sinclair, M. Nathan Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Materials ScienceMo–si MultilayersEngineeringCrystalline DefectsSurface Science	1989	61
Crystallographic texture change during abnormal grain growth in Cu-Co thin films J. M. E. Harper, J. Gupta, D. A. Smith, Applied Physics Letters EngineeringSevere Plastic DeformationCrystal Growth TechnologyFiber TextureCu Thin Films	1994	39
Tantalum and Tantalum Nitride as Diffusion Barriers Between Copper and Silicon Karen Holloway, P. M. Fryer MRS Proceedings Materials EngineeringMaterials ScienceEngineeringDiffusion ResistanceSurface Science	1990	12
Structure and Thermodynamics of Amorphous Ti-Si Produced by Solid-State Interdiffusion Karen Holloway, Pierre Moine, J. Delage, MRS Proceedings Materials ScienceMaterials EngineeringSinteringEngineeringApplied Physics	1990	12

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