Concepedia

Karen Holloway

KH

9

Publications

1.3K

Citations

9

H-Index

1987

Active since

Affiliations

Stanford University(Current)

IBM Research - Thomas J. Watson Research Center

Karen Holloway is an author at Stanford University specializing in applied physics, materials science, and engineering.

Top concepts

EngineeringApplied PhysicsMaterial ScienceSurface ScienceThin FilmsCrystalline DefectsMaterials EngineeringMicrostructureChemistryAmorphous Materials

Publications per year

1987–1994

9

Publications

9

Tantalum as a diffusion barrier between copper and silicon: Failure mechanism and effect of nitrogen additions

Karen Holloway, P. M. Fryer, C. Cabral et al. · Journal of Applied Physics · 1992 · 445 citations

Engineering, Chemistry, Chemical Deposition +16

Tantalum as a diffusion barrier between copper and silicon

Karen Holloway, P. M. Fryer · Applied Physics Letters · 1990 · 261 citations

Materials Engineering, Materials Science, Thin Tantalum Layers +13

Amorphous Ti-Si alloy formed by interdiffusion of amorphous Si and crystalline Ti multilayers

Karen Holloway, Robert Sinclair · Journal of Applied Physics · 1987 · 228 citations

Engineering, Thin Film Process Technology, Silicon On Insulator +20

Interfacial reactions on annealing molybdenum-silicon multilayers

Karen Holloway, Khiem Ba, Robert Sinclair · Journal of Applied Physics · 1989 · 159 citations

Interfacial Reactions, Engineering, Sputtered Mo-si Multilayers +17

High-resolution and in situ tem studies of annealing of Ti-Si multilayers

Karen Holloway, Robert Sinclair · Journal of the Less Common Metals · 1988 · 68 citations

Materials Science, Engineering, Surface Science +7

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