Statistics
Publications
63
Citations
2.5K
H-Index
26
Active since
1984
Affiliations
E. Kolawa is an author at California Institute of Technology specializing in materials science, materials engineering, and thin films.
Publications per year
1984–2010
63
63
Tantalum-based diffusion barriers in Si/Cu VLSI metallizations
E. Kolawa, Jen‐Sue Chen, J.S. Reid et al. · Journal of Applied Physics · 1991 · 222 citations · Full text
Evaluation of amorphous (Mo, Ta, W)SiN diffusion barriers for 〈Si〉|Cu metallizations
J.S. Reid, E. Kolawa, R. Ruiz et al. · Thin Solid Films · 1993 · 165 citations
Natural Sciences, Materials Engineering, Materials Science +12
Reactively sputtered RuO2 diffusion barriers
E. Kolawa, F. C. T. So, E. T-S. Pan et al. · Applied Physics Letters · 1987 · 121 citations
Reactively sputtered Ti-Si-N films I. Physical properties
Xin Sun, J.S. Reid, E. Kolawa et al. · Journal of Applied Physics · 1997 · 109 citations
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