E. T-S. Pan

Reactively sputtered RuO2 diffusion barriers

E. Kolawa, F. C. T. So, E. T-S. Pan et al. · Applied Physics Letters · 1987 · 121 citations

Engineering, Materials Engineering, Materials Science +17

Highly Stable and Sensitive Nucleic Acid Amplification and Cell-Phone-Based Readout

Janay Elise Kong, Qingshan Wei, Derek Tseng et al. · ACS Nano · 2017 · 115 citations

Engineering, Bioengineering, Biomedical Engineering +17

Uniform and thermally stable AuGeNi ohmic contacts to GaAs

Agnese Callegari, E. T-S. Pan, Masanori Murakami · Applied Physics Letters · 1985 · 65 citations

Engineering, Electrical Engineering, Materials Science +17

Reactive sputtering of RuO2 films

E. Kolawa, F. C. T. So, W. Flick et al. · Thin Solid Films · 1989 · 62 citations

Natural Sciences, Materials Engineering, Materials Science +14

W<i>x</i>N1−<i>x</i> alloys as diffusion barriers between Al and Si

F. C. T. So, E. Kolawa, X.‐A. Zhao et al. · Journal of Applied Physics · 1988 · 44 citations

Engineering, Materials Engineering, Materials Science +16