X.‐A. Zhao - Concepedia

Author

X.‐A. Zhao

California Institute of Technology ORCID

Also Known As

X. -A. Zhao, X. A. Zhao, X.-A . Zhao, X.-A. Zhao, X.‐A. Zhao, Xiao‐gang Zhao

Publications

514

Citations

H-Index

Concepts

All Affiliations

California Institute of Technology

About

X.‐A. Zhao is an author at California Institute of Technology specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	9	9	328
2	Applied Physics	9	9	328
3	Materials Engineering	5	5	157
4	Natural Sciences	1	1	51
5	Chemistry	1	1	51

X.‐A. Zhao

Publications

458

Citations

H-Index

Page 1

	Year	Citations
Dielectric and electric relaxations induced by the complex defect clusters in (Yb+Nb) co‐doped rutile TiO <sub>2</sub> ceramics X.‐A. Zhao, Peng Liu Journal of the American Ceramic Society	2017	71
Reactive sputtering of RuO2 films E. Kolawa, F. C. T. So, W. Flick, Thin Solid Films Materials EngineeringMaterials ScienceEngineeringSurface ScienceApplied Physics	1989	62
Correlation between the cohesive energy and the onset of radiation-enhanced diffusion in ion mixing Yang‐Tse Cheng, X.‐A. Zhao, T.C. Banwell, Journal of Applied Physics Materials ScienceIon MixingEngineeringDiffusion ResistancePhysics	1986	56
Transition-metal silicides formed by ion mixing and by thermal annealing: Which species moves? K. Affolter, X.‐A. Zhao, M‐A. Nicolet Journal of Applied Physics EngineeringChemistrySilicon On InsulatorThermal AnnealingIon Process	1985	51
Reaction of thin metal films with crystalline and amorphous Al<sub>2</sub>O<sub>3</sub> X.‐A. Zhao, E. Kolawa, M‐A. Nicolet Journal of Vacuum Science & Technology A Vacuum Surfaces and Films	1986	46
W<i>x</i>N1−<i>x</i> alloys as diffusion barriers between Al and Si F. C. T. So, E. Kolawa, X.‐A. Zhao, Journal of Applied Physics Materials ScienceSemiconductorsDiffusion BarriersSemiconductor TechnologyEngineering	1988	44
TiAl3 formation by furnace annealing of Ti/Al bilayers and the effect of impurities X.‐A. Zhao, F. C. T. So, M.‐A. Nicolet Journal of Applied Physics Materials EngineeringMaterials ScienceAluminium NitrideMaterial AnalysisEngineering	1988	38
Kinetics of NiAl3 growth induced by steady-state thermal annealing at the Ni-〈Al〉 interface X.‐A. Zhao, Heng Yang, E. Ma, Journal of Applied Physics Nial3 GrowthEngineeringCrystal Growth TechnologyNi-〈al〉 InterfaceVacuum Device	1987	30
Cosputtered W75C25 thin film diffusion barriers Hwa-Yueh Yang, X.‐A. Zhao, M.−A. Nicolet Thin Solid Films Materials ScienceEngineeringDiffusion ResistanceSurface ScienceApplied Physics	1988	20
Properties of reactively sputtered Mo1?x O x films F. C. T. So, E. Kolawa, Sen Nieh, Applied Physics A Materials EngineeringMaterials ScienceMaterial AnalysisEngineeringSurface Science	1988	17

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