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Publications
16
Citations
1.2K
H-Index
16
Active since
1991
J.S. Reid is an author at California Institute of Technology specializing in materials science, materials engineering, and natural sciences.
Publications per year
1991–1997
16
16
Tantalum-based diffusion barriers in Si/Cu VLSI metallizations
E. Kolawa, Jen‐Sue Chen, J.S. Reid et al. · Journal of Applied Physics · 1991 · 222 citations · Full text
Evaluation of amorphous (Mo, Ta, W)SiN diffusion barriers for 〈Si〉|Cu metallizations
J.S. Reid, E. Kolawa, R. Ruiz et al. · Thin Solid Films · 1993 · 165 citations
Natural Sciences, Materials Engineering, Materials Science +12
Properties of reactively sputter-deposited TaN thin films
Xin Sun, Elzbieta Kolawa, Jen‐Sue Chen et al. · Thin Solid Films · 1993 · 135 citations
Natural Sciences, Materials Engineering, Materials Science +11
Reactively sputtered Ti-Si-N films I. Physical properties
Xin Sun, J.S. Reid, E. Kolawa et al. · Journal of Applied Physics · 1997 · 109 citations
Ti-Si-N diffusion barriers between silicon and copper
J.S. Reid, Xin Sun, E. Kolawa et al. · IEEE Electron Device Letters · 1994 · 81 citations
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