16
Publications
1.2K
Citations
16
H-Index
1991
Active since
J.S. Reid is an author at California Institute of Technology specializing in materials science, engineering, and applied physics.
Top concepts
EngineeringMaterial ScienceApplied PhysicsMaterials EngineeringThin FilmsSurface ScienceSemiconductorsMicrostructureCrystalline DefectsElectrical Engineering
Publications per year
1991–1997
16
16
Tantalum-based diffusion barriers in Si/Cu VLSI metallizations
E. Kolawa, Jen‐Sue Chen, J.S. Reid et al. · Journal of Applied Physics · 1991 · 222 citations · Full text
Materials Engineering, Materials Science, Electrical Engineering +15
Evaluation of amorphous (Mo, Ta, W)SiN diffusion barriers for 〈Si〉|Cu metallizations
J.S. Reid, E. Kolawa, R. Ruiz et al. · Thin Solid Films · 1993 · 164 citations
Properties of reactively sputter-deposited TaN thin films
Xin Sun, Elzbieta Kolawa, Jen‐Sue Chen et al. · Thin Solid Films · 1993 · 134 citations
Reactively sputtered Ti-Si-N films I. Physical properties
Xin Sun, J.S. Reid, E. Kolawa et al. · Journal of Applied Physics · 1997 · 109 citations
Engineering, Thin Film Process Technology, Physical Properties +16
Ti-Si-N diffusion barriers between silicon and copper
J.S. Reid, Xin Sun, E. Kolawa et al. · IEEE Electron Device Letters · 1994 · 81 citations
Rows per page
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