Physical review. B, Condensed matter · 1994 · 50 citations · 18 references
Materials EngineeringMaterials ScienceEpitaxial GrowthEngineeringGe ConesPhysicsSurface ScienceApplied PhysicsSemiconductor Device FabricationFormation ProcessMolecular Beam EpitaxySilicon On InsulatorRough Ge FilmsChemical Vapor Deposition
The formation of circular cone-shaped Ge islands (12\ifmmode^\circ\else\textdegree\fi{} cones) has been observed for the growth of eight monolayers of Ge on Si(001) at 700 \ifmmode^\circ\else\textdegree\fi{}C using Sb as a surfactant. The Ge cones are strained and grow pseudomorphically, adopting the Si lattice constant. They have a tilt angle of 12\ifmmode^\circ\else\textdegree\fi{} and are composed of [117]-, [105]-type, and all intermediate facets. The island-size distribution is peaked around a typical size of \ensuremath{\sim}300--400 \AA{}, which results from a formation process under equilibrium conditions for diffusion of the Ge atoms. Growth at lower temperatures down to 300 \ifmmode^\circ\else\textdegree\fi{}C with Sb as a surfactant results in epitaxial but very rough Ge films which show a high degree of disorder.
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Kinetic pathway in Stranski-Krastanov growth of Ge on Si(001)
Y. W. Mo, D. E. Savage, B. S. Swartzentruber et al. · Physical Review Letters · 1990 · 1.4K citations
Engineering, Crystal Growth Technology, Silicon On Insulator +18
Surfactants in epitaxial growth
M. Copel, M. C. Reuter, Efthimios Kaxiras et al. · Physical Review Letters · 1989 · 1.1K citations