The properties of aluminum oxide and nitride films prepared by d.c. sputter-deposition from metallic targets

The thermalization of energetic atoms during the sputtering process

R.E. Somekh · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1984 · 305 citations · Full text

Natural Sciences, Materials Science, Physics +14

Control of preferential orientation of AlN films prepared by the reactive sputtering method

Masatou Ishihara, S.J Li, Hisami Yumoto et al. · Thin Solid Films · 1998 · 176 citations

Natural Sciences, Materials Engineering, Materials Science +16

Properties of aluminium oxide thin films deposited by reactive magnetron sputtering

Kari Koski, Jorma Hölsä, P. Juliet · Thin Solid Films · 1999 · 129 citations

Natural Sciences, Materials Engineering, Materials Science +13

Comparative characterization of alumina coatings deposited by RF, DC and pulsed reactive magnetron sputtering

R. Cremer, Mirjam Witthaut, D. Neuschütz et al. · Surface and Coatings Technology · 1999 · 85 citations

Natural Sciences, Materials Engineering, Materials Science +16

Energy transfer into the growing film during sputter deposition: An investigation by calorimetric measurements and Monte Carlo simulations

T. Drüsedau, Torsten Bock, Thomas-Maik John et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1999 · 70 citations

Natural Sciences, Materials Engineering, Materials Science +13