Abnormal residual stress state in ZnO films synthesized by planar magnetron sputtering system with two facing targets

Optical properties of sputter-deposited ZnO:Al thin films

Zechen Jin, I. Hamberg, C.G. Granqvist · Journal of Applied Physics · 1988 · 438 citations

Natural Sciences, Materials Engineering, Materials Science +17

Transparent and highly conductive films of ZnO prepared by rf reactive magnetron sputtering

J. B. Webb, D. F. Williams, M. Buchanan · Applied Physics Letters · 1981 · 182 citations

Natural Sciences, Materials Engineering, Materials Science +17

Aluminium- and indium-doped zinc oxide thin films prepared by DC magnetron reactive sputtering

G. Harding, B. Window, E.C. Horrigan · Solar Energy Materials · 1991 · 54 citations

Natural Sciences, Materials Engineering, Materials Science +16

Evaluation of Macro- and Micro-Residual Stresses on Textdeed Materials by X-ray, Neutron Diffraction and Defection Measurements

Viktor Hauk · Advances in X-ray Analysis · 1985 · 17 citations

Natural Sciences, Materials Engineering, Materials Science +17

AlN Sputtered Film Properties Prepared at Low Gas Pressures by Facing Target System

Kikuo Tominaga, Hiroshi Imai Hiroshi Imai, Masaki Shirai · Japanese Journal of Applied Physics · 1991 · 11 citations

Natural Sciences, Materials Engineering, Materials Science +17