Aluminium- and indium-doped zinc oxide thin films prepared by DC magnetron reactive sputtering

Transparent conductors—A status review

K. L. Chopra, S.S. Major, Dinesh K. Pandya · Thin Solid Films · 1983 · 2.6K citations

Electrical Engineering, Optical Materials, Engineering +6

Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings

John A. Thornton · Journal of Vacuum Science and Technology · 1974 · 2.3K citations

Engineering, Apparatus Geometry, Deposition Conditions +16

Highly Conductive and Transparent Aluminum Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering

Tadatsugu Minami, Hidehito Nanto, Shinzo Takata · Japanese Journal of Applied Physics · 1984 · 548 citations

Materials Science, Aluminium Nitride, Electrical Engineering +12

Group III Impurity Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering

Tadatsugu Minami, Hirotoshi Sato, Hidehito Nanto et al. · Japanese Journal of Applied Physics · 1985 · 546 citations

Materials Engineering, Materials Science, Electrical Engineering +12

Influence of substrate temperature and deposition rate on structure of thick sputtered Cu coatings

John A. Thornton · Journal of Vacuum Science and Technology · 1975 · 432 citations

Engineering, Cu Coatings, Chemical Deposition +19