Influence of Energetic Oxygen Bombardment on Conductive ZnO Films

Kikuo Tominaga, Takayuki Yuasa, Michiya Kume, +1

Japanese Journal of Applied Physics

Materials ScienceMaterials EngineeringElectrical EngineeringEngineeringNanoelectronics +12

Radiation Effect due to Energetic Oxygen Atoms on Conductive Al-Doped ZnO Films

Kikuo Tominaga, Kenji Kuroda, Osamu Tada

Japanese Journal of Applied Physics

Aluminium NitrideEngineeringRadiation EffectNanoelectronicsRf Diode Sputterings +14

Energy Analysis of High-Energy Neutral Atoms in the Sputtering of ZnO and BaTiO₃

Kikuo Tominaga, Satoshi Iwamura, Yoshihiro Shintani, +1

Japanese Journal of Applied Physics

EngineeringEnergetic Oxygen SpeciesVacuum DeviceChemical EngineeringHigh-energy Neutral Atoms +16

Amorphous ZnO–In2O3 transparent conductive films by simultaneous sputtering method of ZnO and In2O3 targets

Kikuo Tominaga, Toru Takao, Akihiko Fukushima, +2

Vacuum

Materials ScienceMaterials EngineeringIn2o3 TargetsEngineeringOxide Electronics +5

Structures and Physical Properties of Films Deposited by Simultaneous DC Sputtering of ZnO and In2O3 or ITO Targets

Toshihiro Moriga, Takashi Okamoto, Kazunori Hiruta, +3

Journal of Solid State Chemistry

Materials EngineeringMaterials ScienceEngineeringNanotechnologyOxide Electronics +8

ZnO–SnO2 transparent conductive films deposited by opposed target sputtering system of ZnO and SnO2 targets

Yukako Hayashi, Kumiko Kondo, Kei‐ichiro Murai, +4

Vacuum

Materials ScienceEngineeringNanotechnologyOxide ElectronicsOpposed Target +5

High-Energy Neutral Atoms in the Sputtering of ZnO

Kikuo Tominaga, Nozomu Ueshiba, Yoshihiro Shintani, +1

Japanese Journal of Applied Physics

EngineeringThin Film Process TechnologyChemical DepositionPlanar DiodeHigh-energy Neutral Atoms +16

Transparent conductive ZnO film preparation by alternating sputtering of ZnO:Al and Zn or Al targets

Kikuo Tominaga, N. Umezu, I. Mori, +3

Thin Solid Films

Materials ScienceMaterials EngineeringEngineeringNanotechnologyOxide Electronics +5

Transparent conducting amorphous Zn–Sn–O films deposited by simultaneous dc sputtering

Toshihiro Moriga, Yukako Hayashi, Kumiko Kondo, +5

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Optical MaterialsEngineeringThin Film Process TechnologySimultaneous Dc MagnetronZno Target +14

Effect of input power on crystal orientation and residual stress in AlN film deposited by dc sputtering

Kazuya Kusaka, Daisuke Taniguchi, T. Hanabusa, +1

Vacuum

Materials EngineeringMaterials ScienceAluminium NitrideMaterial AnalysisEngineering +7