Concepedia

Sidewall restoration of porous ultra low-k dielectrics for sub-45nm technology nodes

H. Chaabouni, L.L. Chapelon, M. Aimadeddine, J. Vitiello, A. Farcy, R. Delsol, P. Brun, Davide Fossati, V. Arnal, T. Chevolleau,

Microelectronic Engineering · 2007 · 19 citations · 4 references

DOI

Concepts

References

4

Mechanism and Kinetics of Hexamethyldisilazane Reaction with a Fumed Silica Surface

M.S. Vedamuthu, Giles Henderson, Jonathan P. Blitz · Journal of Colloid and Interface Science · 2000 · 99 citations

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Recovering Dielectric Loss of Low Dielectric Constant Organic Siloxane during the Photoresist Removal Process

Ting‐Chang Chang, Y. S. Mor, Po‐Tsun Liu et al. · Journal of The Electrochemical Society · 2002 · 42 citations

, , +17

Investigation on hexamethyldisilazane vapor treatment of plasma-damaged nanoporous organosilicate films

Bashar Lahlouh, Jorge Lubguban, N. Biswas et al. · Applied Surface Science · 2005 · 29 citations

, , +13

Electrical Equivalent Sidewall Damage in Patterned Low-k Dielectrics

Francesca Iacopi, Michele Stucchi, Karen Maex · Electrochemical and Solid-State Letters · 2004 · 26 citations

, , +16