R. Delsol

Oxygen barrier efficiency of hexamethyldisiloxane/oxygen plasma-deposited coating

L. Agres, Y. S�gui, R. Delsol et al. · Journal of Applied Polymer Science · 1996 · 76 citations

Materials Science, Polypropylene Substrate, Engineering +13

Fully-depleted SOI technology using high-k and single-metal gate for 32 nm node LSTP applications featuring 0.179 μm² 6T-SRAM bitcell

C. Fenouillet-Béranger, J. Todeschini, Jean-Christophe Le-Denmat et al. · 2007 · 61 citations

Pmos Transistors, Semiconductor Technology, Electrical Engineering +13

Sidewall restoration of porous ultra low-k dielectrics for sub-45nm technology nodes

H. Chaabouni, L.L. Chapelon, M. Aimadeddine et al. · Microelectronic Engineering · 2007 · 19 citations

Materials Science, Electrical Engineering, Engineering +9

Electronic and chemical properties of the TaN/a-SiOC:H stack studied by photoelectron spectroscopy for advanced interconnects

E. Martínez, C. Guedj, D. Mariolle et al. · Journal of Applied Physics · 2008 · 18 citations

Engineering, Chemistry, Silicon On Insulator +18

TaN/Ta bilayer barrier characteristics and integration for 90 and 65nm nodes

J.P. Jacquemin, Eric Labonne, C. Yalicheff et al. · Microelectronic Engineering · 2005 · 11 citations

Materials Science, Electrical Engineering, Engineering +9