Electronics Letters · 1980 · 14 citations · 0 references
Natural SciencesMaterials EngineeringMaterials ScienceElectronic MaterialsSemiconductor MaterialsSurface ScienceDiffusion In SolidsDopingSemiconductor SurfacesSurface DiffusionSurface PhysicsThin Film DiffusionAbrupt JunctionsJunction EngineeringP-type Doping
We describe a new diffusion process to obtain Zn-doped p+-InP layers in an open ampoule in a PH3/H2 atmosphere. Using this process, we are able to control the diffusion and to realise planar and abrupt junctions while conserving the mirror-like InP surface.