Spatial localization of impurities in δ-doped GaAs

E. F. Schubert, J. B. Stark, B. Ullrich, J. E. Cunningham

Applied Physics Letters · 1988 · 111 citations · 5 references

Concepts

Abstract

Capacitance-voltage profiles on δ-doped GaAs grown by molecular beam epitaxy reveal extremely narrow widths of ≲40 Å at room temperature. Subband structure and capacitance-voltage (C-V) profiles of δ-doped GaAs are calculated self-consistently. Experimental C-V profiles agree with self-consistent results, only if we assume that Si impurities are localized on the length scale of the lattice constant in the host GaAs zinc-blende lattice.

References

5