Journal of Applied Physics · 1998 · 122 citations · 21 references
SemiconductorsMaterials ScienceWide-bandgap SemiconductorEngineeringNitrogen SputteringPhysicsSurface ScienceApplied PhysicsQuantum MaterialsAluminum Gallium NitrideGan Power DeviceGallium OxideGa 3DElectronic PropertiesCategoryiii-v Semiconductor
We use low energy electron diffraction, Auger electron spectroscopy, and ultraviolet and x-ray photoemission spectroscopy to study the surface structure, stoichiometry, and electronic properties of n- and p-type GaN (0001) grown by metal-organic chemical vapor deposition. Ordered (1×1) surfaces with nearly stoichiometric composition are prepared by nitrogen sputtering and annealing. The band bending is found to be 0.75±0.1 eV up and 0.75±0.1 eV down for n- and p-type samples, respectively. The work function, electron affinity, and Ga 3d core level binding energy are also determined.
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InGaN-Based Multi-Quantum-Well-Structure Laser Diodes
Shuji Nakamura, Masayuki Senoh, Shin‐ichi Nagahama et al. · Japanese Journal of Applied Physics · 1996 · 2.5K citations