IEEE Journal of Photovoltaics · 2015 · 28 citations · 18 references
Materials ScienceSemiconductorsElectrical EngineeringEngineeringHoneycomb StructureMaterials CharacterizationApplied PhysicsSurface ScienceLarge-area HoneycombProcess ChainSurface EngineeringSemiconductor Device FabricationPlasma EtchingThin FilmsRoller Nanoimprint LithographyPhotovoltaicsNanolithography MethodSolar Cell Materials
In this paper, large-area honeycomb (HC) texturing of multi-crystalline Si substrates with a newly developed process chain based on roller nanoimprint lithography and inline-capable plasma etching is demonstrated. The realized HC-textures show optical properties superior to random pyramids on c-Si, while the surface passivation quality is comparable. First, results on 156 × 156 mm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> multi-crystalline Si solar cells with an aluminum back-surface field show an efficiency of η = 17.8% compared with η = 17.3% on isotextured reference samples. This efficiency gain of 0.5% results from an increase in J <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">sc</sub> of up to 1.3 mA/cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> , which underlines the high optical and electrical quality of the texture. On a smaller area (50 × 50 mm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> ), the gain in J <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">sc</sub> of HC-textured cells compared with isotextured references was even higher with up to 2.5 mA/cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> .
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Imprint of sub-25 nm vias and trenches in polymers
Stephen Y. Chou, Peter R. Krauss, Preston J. Renstrom · Applied Physics Letters · 1995 · 2.7K citations
Mold-assisted nanolithography: A process for reliable pattern replication
J. Haisma, M.J. Verheijen, Kees van den Heuvel et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1996 · 651 citations
Engineering, Mold-assisted Nanolithography, Pattern Transfer +16
Texturing industrial multicrystalline silicon solar cells
Daniel Macdonald, A. Cuevas, Mark Kerr et al. · Solar Energy · 2003 · 261 citations