Journal of Applied Physics · 1998 · 13 citations · 11 references
SemiconductorsSemiconductor TechnologyElectrical EngineeringElectronic DevicesPlanar-doped Mbe-gaas SamplesElectronic MaterialsPhysicsCurrent SpectroscopyEngineeringSemiconductor DeviceApplied PhysicsSemiconductor MaterialMolecular Beam EpitaxyMicroelectronicsOptoelectronicsCompound SemiconductorPlanar-doped LayerTsc Spectroscopy
Using thermally stimulated current (TSC) spectroscopy we have identified the presence of several deep traps in low temperature grown (LTG) nonintentionally doped bulk molecular beam epitaxy (MBE)-GaAs and silicon planar-doped MBE-GaAs samples. The experiments of TSC spectroscopy were carried out on a LTG MBE-GaAs epilayer grown at 300 °C and the planar-doped layer with a nominal silicon concentration of 3.4×1012 cm−2. The LTG nonintentionally doped bulk MBE-GaAs sample shows three peaks in the TSC spectra but the planar-doped MBE-GaAs sample shows spectra similar to those of bulk samples grown by the liquid-encapsulated Czochralski and vertical gradient freeze methods. The main achievement is the experimental evidence that the potential well present in the planar-doped sample is effective in detecting the presence of different deep traps previously not seen in LTG bulk MBE-GaAs epilayers due to a shorter carrier lifetime (about 10−12 s) in the conduction band which occurs due to EL2-like deep traps recombination. This fact is evidenced by a strong hopping conduction in LTG bulk MBE-GaAs samples at temperatures lower than 300 K, but not in planar-doped MBE-GaAs samples because the two-dimensional electron gas has a higher mobility than lateral LTG bulk MBE-GaAs epilayers.
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Arsenic antisite-related defects in low-temperature MBE grown GaAs
Klaus Krambrock, Matthias Linde, J.‐M. Spaeth et al. · Semiconductor Science and Technology · 1992 · 49 citations