Concepedia
Thin Solid Films · 2006 · 15 citations · 13 references
Materials EngineeringMaterials ScienceElectrical EngineeringMos DevicesEngineeringIi-vi SemiconductorNanoelectronicsOxide ElectronicsApplied PhysicsGallium OxideMicroelectronicsSemiconductor Device
13
Hafnium and zirconium silicates for advanced gate dielectrics
G. D. Wilk, Robert M. Wallace, J. Anthony · Journal of Applied Physics · 2000 · 971 citations
Materials Engineering, Materials Science, Electrical Engineering +14
Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications
C. Chaneliere, Jean‐Luc Autran, R. A. B. Devine et al. · Materials Science and Engineering R Reports · 1998 · 668 citations
Materials Science, Engineering, Oxide Electronics +4
Thermal stability and electrical characteristics of ultrathin hafnium oxide gate dielectric reoxidized with rapid thermal annealing
Byoung Hun Lee, Laegu Kang, R. Nieh et al. · Applied Physics Letters · 2000 · 605 citations
Engineering, Thin Film Process Technology, Semiconductor Device +18
Electrical properties of hafnium silicate gate dielectrics deposited directly on silicon
G. D. Wilk, Robert M. Wallace · Applied Physics Letters · 1999 · 503 citations
Materials Science, Materials Engineering, Electrical Engineering +15
Thermal stability of ultrathin ZrO2 films prepared by chemical vapor deposition on Si(100)
T.S. Jeon, J.M. White, D. L. Kwong · Applied Physics Letters · 2001 · 269 citations
Materials Science, Semiconductors, Chemical Engineering +12