Polymer Screening Method for Chemically Amplified Electron Beam and X-Ray Resists

Abstract

In the acid generation processes of chemically amplified electron beam and X-ray resists, protons come from not acid generators but base polymers. This means that the selection of base polymers has a great effect on the acid generation efficiency. In this article we describe a convenient method of screening polymers for acid generation. We also showed the difference in acid generation efficiencies among substituted polystyrenes.