Concepedia

Atsuro Nakano

AN

13

Publications

751

Citations

13

H-Index

2003

Active since

Affiliations

The University of Osaka(Current)

Tokyo Ohka Kogyo (Japan)

Yokkaichi University

Atsuro Nakano is an author at The University of Osaka specializing in chemistry, engineering, and polymer chemistry.

Top concepts

Publications per year

2003–2006

13

Publications

13

Proton Dynamics in Chemically Amplified Electron Beam Resists

Hiroki Yamamoto, Takahiro Kozawa, Atsuro Nakano et al. · Japanese Journal of Applied Physics · 2004 · 179 citations

, , +18

Potential Cause of Inhomogeneous Acid Distribution in Chemically Amplified Resists for Post Optical Lithography

Hiroki Yamamoto, Takahiro Kozawa, Atsuro Nakano et al. · Japanese Journal of Applied Physics · 2005 · 132 citations

, , +18

Acid Generation Mechanism of Poly(4-hydroxystyrene)-Based Chemically Amplified Resists for Post-Optical Lithography: Acid Yield and Deprotonation Behavior of Poly(4-hydroxystyrene) and Poly(4-methoxystyrene)

Atsuro Nakano, Takahiro Kozawa, Kazumasa Okamoto et al. · Japanese Journal of Applied Physics · 2006 · 80 citations

, , +20

Relation between spatial resolution and reaction mechanism of chemically amplified resists for electron beam lithography

Takahiro Kozawa, Akinori Saeki, Atsuro Nakano et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2003 · 66 citations

, , +26

Polymer Screening Method for Chemically Amplified Electron Beam and X-Ray Resists

Hiroki Yamamoto, Atsuro Nakano, Kazumasa Okamoto et al. · Japanese Journal of Applied Physics · 2004 · 63 citations

, , +16

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