Proton Dynamics in Chemically Amplified Electron Beam Resists

Hiroki Yamamoto, Takahiro Kozawa, Atsuro Nakano, +6

Japanese Journal of Applied Physics

Coumarin 6EngineeringResponsive PolymersChemistryPolymers +16

Potential Cause of Inhomogeneous Acid Distribution in Chemically Amplified Resists for Post Optical Lithography

Hiroki Yamamoto, Takahiro Kozawa, Atsuro Nakano, +5

Japanese Journal of Applied Physics

EngineeringElectron-beam LithographyAcid Generation EfficiencyAcid GenerationChemistry +16

Acid Generation Mechanism of Poly(4-hydroxystyrene)-Based Chemically Amplified Resists for Post-Optical Lithography: Acid Yield and Deprotonation Behavior of Poly(4-hydroxystyrene) and Poly(4-methoxystyrene)

Atsuro Nakano, Takahiro Kozawa, Kazumasa Okamoto, +3

Japanese Journal of Applied Physics

EngineeringElectron-beam LithographyChemistryMolecular PolymerChemical Engineering +18

Relation between spatial resolution and reaction mechanism of chemically amplified resists for electron beam lithography

Takahiro Kozawa, Akinori Saeki, Atsuro Nakano, +2

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

EngineeringElectron-beam LithographyMicroscopyChemistryIon Process +24

Polymer Screening Method for Chemically Amplified Electron Beam and X-Ray Resists

Hiroki Yamamoto, Atsuro Nakano, Kazumasa Okamoto, +2

Japanese Journal of Applied Physics

X-ray SpectroscopyEngineeringElectron-beam LithographyAcid GenerationChemistry +14

Reactivity of Acid Generators for Chemically Amplified Resists with Low-Energy Electrons

Atsuro Nakano, Takahiro Kozawa, Seiichi Tagawa, +4

Japanese Journal of Applied Physics

EngineeringPulsed Electron BeamChemistryElectron BeamsChemical Engineering +15

Dependence of acid generation efficiency on the protection ratio of hydroxyl groups in chemically amplified electron beam, x-ray and EUV resists

Hiroki Yamamoto, Takahiro Kozawa, Atsuro Nakano, +5

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Chemical EngineeringEngineeringElectron-beam LithographyElectron BeamPolymer Science +7

Pulse Radiolysis Study on Proton and Charge Transfer Reactions in Solid Poly(methyl methacrylate)

Atsuro Nakano, Kazumasa Okamoto, Takahiro Kozawa, +1

Japanese Journal of Applied Physics

Chemical KineticsX-ray SpectroscopyEngineeringSolid PmmaChemistry +17

Effects of Ester Groups on Proton Generation and Diffusion in Polymethacrylate Matrices

Atsuro Nakano, Kazumasa Okamoto, Takahiro Kozawa, +1

Japanese Journal of Applied Physics

EngineeringOrganic ChemistryResist PerformanceAcid GenerationChemistry +16

Study on acid generation from polymer

Hiroki Yamamoto, Takahiro Kozawa, Atsuro Nakano, +5

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Materials ScienceChemical EngineeringEngineeringAcid GeneratorsElectron Beam +13