Adhesion improvements in silicon carbide deposited by plasma enhanced chemical vapour deposition

Stress-related effects in thin films

John A. Thornton, David W. Hoffman · Thin Solid Films · 1989 · 1.1K citations

Natural Sciences, Materials Engineering, Materials Science +14

Adhesion testing by the scratch test method: The influence of intrinsic and extrinsic parameters on the critical load

P.-A. Steinmann, Y. Tardy, H.E. Hintermann · Thin Solid Films · 1987 · 440 citations

Natural Sciences, Materials Engineering, Materials Science +17

Intrinsic stress and mechanical properties of hydrogenated silicon carbide produced by plasma-enhanced chemical vapor deposition

H. Windischmann · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1991 · 75 citations

Natural Sciences, Materials Engineering, Materials Science +17

On the relation between deposition conditions and (mechanical) stress in plasma silicon nitride layers

W. A. P. Claassen, W.G.J.M. Valkenburg, W. M. van de Wijgert et al. · Thin Solid Films · 1985 · 46 citations

Natural Sciences, Materials Engineering, Materials Science +14

Infrared spectroscopic study of hydrogenated and deuterated silicon nitride films prepared from plasma-enhanced deposition

Masahiko Maeda, Hiroaki Nakamura · Journal of Applied Physics · 1984 · 26 citations

Natural Sciences, Chemistry, Materials Science +17