Concepedia

On the relation between deposition conditions and (mechanical) stress in plasma silicon nitride layers

W. A. P. Claassen, W.G.J.M. Valkenburg, W. M. van de Wijgert, M. F. C. Willemsen

Thin Solid Films · 1985 · 46 citations · 10 references

DOI

Concepts

References

10

A Study of the Dissolution of SiO[sub 2] in Acidic Fluoride Solutions

John Judge · Journal of The Electrochemical Society · 1971 · 293 citations · Full text

, , +11

Influence of Deposition Temperature, Gas Pressure, Gas Phase Composition, and RF Frequency on Composition and Mechanical Stress of Plasma Silicon Nitride Layers

W. A. P. Claassen, W. G. J. N. Valkenburg, M. F. C. Willemsen et al. · Journal of The Electrochemical Society · 1985 · 191 citations

, , +15

Characterization of Plasma Silicon Nitride Layers

W. A. P. Claassen, W. G. J. N. Valkenburg, F.H.P.M. Habraken et al. · Journal of The Electrochemical Society · 1983 · 153 citations

, , +17

Elastic stiffness and thermal expansion coefficients of various refractory silicides and silicon nitride films

T.F. Retajczyk, A. K. Sinha · Thin Solid Films · 1980 · 148 citations

, , +17

Hydrogen content of a variety of plasma-deposited silicon nitrides

Ray Chow, W. A. Lanford, Keming Wang et al. · Journal of Applied Physics · 1982 · 136 citations

, , +15