Publication | Closed Access
On the relation between deposition conditions and (mechanical) stress in plasma silicon nitride layers
45
Citations
10
References
1985
Year
Materials ScienceEngineeringMechanical EngineeringApplied PhysicsSurface SciencePlasma SiliconSemiconductor Device FabricationDeposition ConditionsSilicon On InsulatorPlasma ProcessingPlasma EtchingChemical Vapor DepositionMicrostructure
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