M. F. C. Willemsen

Influence of Deposition Temperature, Gas Pressure, Gas Phase Composition, and RF Frequency on Composition and Mechanical Stress of Plasma Silicon Nitride Layers

W. A. P. Claassen, W. G. J. N. Valkenburg, M. F. C. Willemsen et al. · Journal of The Electrochemical Society · 1985 · 190 citations

Engineering, Mechanical Engineering, Plasma Physics +19

Hydrogen in low-pressure chemical-vapor-deposited silicon (oxy)nitride films

F.H.P.M. Habraken, R. H. G. Tijhaar, W. F. van der Weg et al. · Journal of Applied Physics · 1986 · 77 citations

Engineering, Crystalline Defects, Low-pressure Chemical-vapor-deposited Silicon +13

<i>I</i> <i>n</i> <i>s</i> <i>i</i> <i>t</i> <i>u</i> investigation of TiN formation on top of TiSi2

M. F. C. Willemsen, A. E. T. Kuiper, A. H. Reader et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1988 · 54 citations

Engineering, Solid-state Chemistry, Chemistry +18

On the relation between deposition conditions and (mechanical) stress in plasma silicon nitride layers

W. A. P. Claassen, W.G.J.M. Valkenburg, W. M. van de Wijgert et al. · Thin Solid Films · 1985 · 45 citations

Materials Science, Engineering, Mechanical Engineering +10

Thermal oxidation of silicon nitride and silicon oxynitride films

A. E. T. Kuiper, M. F. C. Willemsen, J. Mulder et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1989 · 42 citations

Materials Science, Chemical Engineering, Engineering +11