W. A. P. Claassen - Concepedia

Author

W. A. P. Claassen

Philips (Netherlands)

Also Known As

W. A. P. CLAASSEN, W. A. P. Claassen, W. Claassen, W.A.P. Claassen, Wim A.P. Claassen

Publications

1.4K

Citations

H-Index

Concepts

All Affiliations

Philips (Netherlands)Philips (Finland)Philips (United States)

About

W. A. P. Claassen is an author at Philips (Netherlands) specializing in engineering, applied physics, and surface science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	17	18	1.3K
2	Applied Physics	15	15	1.2K
3	Chemistry	6	6	397
4	Natural Sciences	3	3	350
5	Chemical Engineering	2	2	74

W. A. P. Claassen

Publications

1.3K

Citations

H-Index

Page 1

	Year	Citations
Influence of Deposition Temperature, Gas Pressure, Gas Phase Composition, and RF Frequency on Composition and Mechanical Stress of Plasma Silicon Nitride Layers W. A. P. Claassen, W. G. J. N. Valkenburg, M. F. C. Willemsen, Journal of The Electrochemical Society EngineeringMechanical EngineeringPlasma PhysicsSimplified Reaction ModelSilicon On Insulator	1985	190
The Determination of the Elastic Constants of Nematic Liquid Crystals Wim H. de Jeu, W. A. P. Claassen, A. M. J. Spruijt Molecular crystals and liquid crystals Crystal StructureEngineeringMechanical EngineeringNematic Liquid CrystalsSoft Matter	1976	165
Characterization of Plasma Silicon Nitride Layers W. A. P. Claassen, W. G. J. N. Valkenburg, F.H.P.M. Habraken, Journal of The Electrochemical Society Materials SciencePlasma ElectronicsEngineeringPlasma ProcessingSilicon‐nitrogen Ratio	1983	152
The elastic constants of nematic liquid crystalline terminally substituted azoxybenzenes Wim H. de Jeu, W. A. P. Claassen The Journal of Chemical Physics Materials ScienceCrystal StructureEngineeringPhysicsCrystal Material	1977	98
The Nucleation of CVD Silicon on SiO2 and Si3 N 4 Substrates: I . The System at High Temperatures W. A. P. Claassen, J. Bloem Journal of The Electrochemical Society EngineeringInitial NucleationSilicon On InsulatorSiliceneCvd Silicon	1980	95
Physical studies of nematic azoxybenzenes. I. Magnetic susceptibilities and the order parameter Wim H. de Jeu, W. A. P. Claassen The Journal of Chemical Physics MagnetismChemical ThermodynamicsEngineeringMolecule-based MagnetPhysics	1978	87
The deposition of silicon from silane in a low-pressure hot-wall system W. A. P. Claassen, J. Bloem, W. G. J. N. Valkenburg, Journal of Crystal Growth EngineeringMicrofabricationSurface ScienceApplied PhysicsSilicene	1982	75
Characterization of Silicon‐Oxynitride Films Deposited by Plasma‐Enhanced CVD W. A. P. Claassen, H. A. J. Th. v. d. Pol, A. H. Goemans, Journal of The Electrochemical Society Materials SciencePlasma‐enhanced DepositionSilicon‐oxynitride LayersEngineeringPlasma‐enhanced Cvd	1986	65
Rate-determining reactions and surface species in CVD of silicon J. Bloem, W. A. P. Claassen Journal of Crystal Growth Surface SpeciesEngineeringPhysicsSurface ScienceApplied Physics	1980	62
Rate-determining reactions and surface species in CVD of silicon W. A. P. Claassen, J. Bloem Journal of Crystal Growth Surface SpeciesEngineeringPhysicsSurface ScienceApplied Physics	1980	61

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