W. G. J. N. Valkenburg

Influence of Deposition Temperature, Gas Pressure, Gas Phase Composition, and RF Frequency on Composition and Mechanical Stress of Plasma Silicon Nitride Layers

W. A. P. Claassen, W. G. J. N. Valkenburg, M. F. C. Willemsen et al. · Journal of The Electrochemical Society · 1985 · 190 citations

Engineering, Mechanical Engineering, Plasma Physics +19

Characterization of Plasma Silicon Nitride Layers

W. A. P. Claassen, W. G. J. N. Valkenburg, F.H.P.M. Habraken et al. · Journal of The Electrochemical Society · 1983 · 152 citations

Materials Science, Plasma Electronics, Engineering +11

The deposition of silicon from silane in a low-pressure hot-wall system

W. A. P. Claassen, J. Bloem, W. G. J. N. Valkenburg et al. · Journal of Crystal Growth · 1982 · 75 citations

Engineering, Microfabrication, Surface Science +8

Rate-determining reactions and surface species in CVD silicon

J. Bloem, W. A. P. Claassen, W. G. J. N. Valkenburg · Journal of Crystal Growth · 1982 · 25 citations

Engineering, Physics, Surface Science +6