Applied Physics Letters · 2005 · 22 citations · 16 references
Natural SciencesElectrical EngineeringMaterials ScienceElectronic MaterialsMicroelectronicsThin FilmsDielectric CeramicsDielectricsMetal OxidesMicrowave Integrated CircuitsRadio-frequency Integrated CircuitsThin Film Electrical PropertiesCapacitanceCapacitance-voltage CharacteristicsCapacitor DielectricsCapacitorsElectrical PropertiesLeakage CurrentTan DeltaThin Oxide Films
The dielectric and electrical properties of a BaTi4O9 film were investigated in order to evaluate its potential use in metal-insulator-metal (MIM) capacitors for rf/mixed signal integrated circuits. A high capacitance density of 4.62fF∕μm2 along with a low tanδ of 0.0025 were obtained at 100 kHz. A high capacitance density of 4.12fF∕μm2 and a high quality factor of 322 were also achieved at 2 GHz. The leakage current density was approximately 1nA∕cm2 at ±2V. Small linear and quadratic voltage coefficients of capacitance of 110ppm∕V and 40.05ppm∕V2, respectively, and a small temperature coefficient of capacitance of −92.157ppm∕°C at 100 kHz were obtained. These results demonstrate that the BaTi4O9 film is a good candidate material for MIM capacitors.
16
K. Wakino, Kiichi Minai, Hiroshi Tamura · Journal of the American Ceramic Society · 1984 · 518 citations
Natural Sciences, Materials Engineering, Materials Science +17
A high performance MIM capacitor using HfO<sub>2</sub> dielectrics
Hang Hu, Chunxiang Zhu, Yongfeng Lu et al. · IEEE Electron Device Letters · 2002 · 131 citations
A capacitorless double-gate DRAM cell
Chenming Hu, Tsu‐Jae King, Chenming Hu · IEEE Electron Device Letters · 2002 · 130 citations
Engineering, Computer Engineering, Electrical Engineering +14