BaTi 4 O 9 thin films for high-performance metal-insulator-metal capacitors

Bo-Yun Jang, Beom-Jong Kim, Suk Jin Lee, Kyong-Jae Lee, Sahn Nahm, Ho‐Jung Sun, Hwack-Joo Lee

Applied Physics Letters · 2005 · 22 citations · 16 references

Concepts

Abstract

The dielectric and electrical properties of a BaTi4O9 film were investigated in order to evaluate its potential use in metal-insulator-metal (MIM) capacitors for rf/mixed signal integrated circuits. A high capacitance density of 4.62fF∕μm2 along with a low tanδ of 0.0025 were obtained at 100 kHz. A high capacitance density of 4.12fF∕μm2 and a high quality factor of 322 were also achieved at 2 GHz. The leakage current density was approximately 1nA∕cm2 at ±2V. Small linear and quadratic voltage coefficients of capacitance of 110ppm∕V and 40.05ppm∕V2, respectively, and a small temperature coefficient of capacitance of −92.157ppm∕°C at 100 kHz were obtained. These results demonstrate that the BaTi4O9 film is a good candidate material for MIM capacitors.

References

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