Concepedia

Comparative study of PECVD SiOCH low-k films obtained at different deposition conditions

Denis Shamiryan, Ken Weidner, William D. Gray, Mikhaı̈l R. Baklanov, S. Vanhaelemeersch, Karen Maex

Microelectronic Engineering · 2002 · 26 citations · 3 references

DOI

Concepts

References

3

Comparative study of SiOCH low-<i>k</i> films with varied porosity interacting with etching and cleaning plasma

Denis Shamiryan, Mikhaı̈l R. Baklanov, S. Vanhaelemeersch et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2002 · 150 citations

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Nondestructive Determination of Pore Size Distribution in Thin Films Deposited on Solid Substrates

F. N. Dultsev · Electrochemical and Solid-State Letters · 1999 · 64 citations

, , +17

Controllable Change of Porosity of 3-Methylsilane Low-k Dielectric Film

Denis Shamiryan, Mikhaı̈l R. Baklanov, S. Vanhaelemeersch et al. · Electrochemical and Solid-State Letters · 2001 · 37 citations

, , +16