Applied Physics Letters · 2008 · 43 citations · 18 references
Materials ScienceElectrical EngineeringInterface StructureEngineeringPhysicsOxygen-related DefectOxide ElectronicsMagnetic Resonance SpectroscopyApplied PhysicsCondensed Matter PhysicsGallium OxideDefect FormationVacuum DeviceGe/oxide InterfaceBond Electrical ActivityDefect ToleranceElectrochemical InterfaceMicroelectronics
The nature of the defects present at the Ge/oxide interface has been investigated by electrically detected magnetic resonance spectroscopy. In vacuo atomic oxygen exposure has been exploited to generate germanium oxide with variable composition according to the oxidation temperature. Two different kinds of interfacial defects have been identified, which correspond to the Ge dangling bonds and to an oxygen-related defect.
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Statistics of the Recombinations of Holes and Electrons
W. Shockley, W. T. Read · Physical Review · 1952 · 6.3K citations
High-k/Ge MOSFETs for future nanoelectronics
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Materials Science, Materials Engineering, Electrical Engineering +12
Spin-Dependent Recombination on Silicon Surface
D. Lépine · Physical review. B, Solid state · 1972 · 356 citations