Concepedia

Publication | Closed Access

Advantages of HfAlON gate dielectric film for advanced low power CMOS application

DOI

18

Citations

3

References

2005

Year

Akira Toriumi, Kunihiko Iwamoto, Hiroyuki Ota, Masaru Kadoshima, Wataru Mizubayashi, Toshihide Nabatame, Arito Ogawa, Koji Tominaga, Tsuyoshi Horikawa, Hideki Satake
Microelectronic Engineering

References

YearCitations

Page 1