Japanese Journal of Applied Physics · 2005 · 26 citations · 6 references
Natural SciencesPhysicsPlasma PhysicsSpectroscopySurface ScienceAtomic IonizationHigh-temperature PlasmasIonization ProcessesMagnetized PlasmaDensityElectron Impact IonizationElectron IonizationGas Pressure EffectsLaser-induced FluorescenceLaser-induced Fluorescence SpectroscopyMagnetron SputteringSputtering
We measured two-dimensional distributions of Ti and Ti + densities in magnetron sputtering plasmas by laser-induced fluorescence (LIF) imaging spectroscopy. It has been found that the production of Ti + is enhanced by a high gas pressure. The peak of the Ti + density is located at a distance of 4–5 cm from the target surface, indicating the gas-phase production of Ti + in the downstream plasma. Since the plasma density and the electron temperature measured using a Langmuir probe are low in the downstream plasma, this result suggests that the dominant production process of Ti + is not electron impact ionization of Ti (Ti+e→Ti + e+e). Although another candidate for the gas-phase production of Ti + is Penning ionization (Ti+Ar M →Ti + +Ar+e), experimental results on Ar M is negative about the contribution of Penning ionization to the gas-phase production of Ti + .
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Metal ion deposition from ionized mangetron sputtering discharge
S. M. Rossnagel, Jeffrey Hopwood · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1994 · 307 citations
Natural Sciences, Materials Engineering, Materials Science +17
Directional and ionized physical vapor deposition for microelectronics applications
S. M. Rossnagel · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 168 citations
Natural Sciences, Electrical Engineering, Materials Science +17