The influence of nitrogen and fluorine on the dielectric constant of hydrogenated amorphous carbon (a-C:H) films

Diamond-like amorphous carbon

John Robertson · Materials Science and Engineering R Reports · 2002 · 6K citations

Materials Science, Diamond-like Carbon, Engineering +4

Low Dielectric Constant Materials for ULSI Interconnects

Michael Morgen, E. Todd Ryan, Jie-Hua Zhao et al. · Annual Review of Materials Science · 2000 · 385 citations

Engineering, Integrated Circuits, Ulsi Interconnects +16

Low-k dielectric materials

Denis Shamiryan, Thomas Abell, Francesca Iacopi et al. · Materials Today · 2004 · 377 citations · Full text

Dielectrics, Engineering, Vlsi Design +20

Fluorinated amorphous carbon films for low permittivity interlevel dielectrics

Jeremy Theil · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 72 citations

Engineering, Thin Film Process Technology, Chemical Deposition +16

High resistivity and low dielectric constant amorphous carbon nitride films: application to low-k materials for ULSI

Masami Aono · Diamond and Related Materials · 2002 · 44 citations

Materials Science, Materials Engineering, Low-k Materials +8