Large flexible nanowire grid visible polarizer made by nanoimprint lithography

Abstract

117 and 150nm pitch polymer gratings were successfully fabricated on plastic substrate over large area by nanoimprint lithography. Nanowire-grid polarizers were made by depositing Al on the sidewalls of the gratings at oblique angles. The effects of grating period, grating linewidth, Al depth, and thickness were studied in detail. Excellent contrast (∼1000:1) and high transmittance (80%–90%) (without antireflection coating) at the wavelength of 500nm and above were demonstrated.