Japanese Journal of Applied Physics · 2002 · 61 citations · 4 references
EngineeringElectrical EngineeringMaterials ScienceOptoelectronicsSemiconductor DevicesSemiconductor MaterialsDopingLight SourcesLight-emitting DiodesQuantum WellsSemiconductor Device MaterialsSemiconductor PhysicsCurrent CrowdingDifferential ResistanceDoping Effects On Device PerformanceGallium Nitride (Gan) MaterialsLateral ResistanceLight-emitting DevicesQuantum Well StructuresUltraviolet Light-emitting Diodes
We report on a study of current crowding in AlInGaN multiple quantum well based deep ultra-violet light emitting diodes. For lateral geometry devices on sapphire substrates, our study concludes that the thickness and doping level of the high Al-content buffer and the cladding n-AlGaN layers is a key contributor to the lateral resistance and hence current crowding at the mesa edges. The inhomogeneous pumping of large area devices results in increased differential resistance causing a pronounced localized overheating. This degrades the device performance under high dc current operation. We also show stripe geometry to be a better choice for high power deep ultra-violet light emitting diodes on sapphire.
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Lattice and energy band engineering in AlInGaN/GaN heterostructures
M. Asif Khan, Jun Yang, G. Simin et al. · Applied Physics Letters · 2000 · 159 citations
High-quality p–n junctions with quaternary AlInGaN/InGaN quantum wells
A. Chitnis, Ajay Kumar, M. Shatalov et al. · Applied Physics Letters · 2000 · 72 citations · Full text