Lateral Current Crowding in Deep UV Light Emitting Diodes over Sapphire Substrates

M. Shatalov, G. Simin, V. Adivarahan, A. Chitnis, Shuai Wu, R. Pachipulusu, Kirill Simin, Jianping Zhang, Jin Wei Yang, M. Asif Khan

Japanese Journal of Applied Physics · 2002 · 61 citations · 4 references

Concepts

Abstract

We report on a study of current crowding in AlInGaN multiple quantum well based deep ultra-violet light emitting diodes. For lateral geometry devices on sapphire substrates, our study concludes that the thickness and doping level of the high Al-content buffer and the cladding n-AlGaN layers is a key contributor to the lateral resistance and hence current crowding at the mesa edges. The inhomogeneous pumping of large area devices results in increased differential resistance causing a pronounced localized overheating. This degrades the device performance under high dc current operation. We also show stripe geometry to be a better choice for high power deep ultra-violet light emitting diodes on sapphire.

References

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