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Lattice parameters of gallium nitride
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1996
Year
Materials ScienceAluminium NitrideEngineeringPhysicsCubic Boron NitrideApplied PhysicsCondensed Matter PhysicsAluminum Gallium NitrideGallium OxideHigh-resolution X-ray DiffractionCategoryiii-v SemiconductorGallium NitrideGallium Nitride Layers
Lattice parameters of gallium nitride were measured using high-resolution x-ray diffraction. The following samples were examined: (i) single crystals grown at pressure of about 15 kbar, (ii) homoepitaxial layers, (iii) heteroepitaxial layers (wurtzite structure) on silicon carbide, on sapphire, and on gallium arsenide, (iv) cubic gallium nitride layers on gallium arsenide. The differences between the samples are discussed in terms of their concentrations of free electrons and structural defects.