High rate deposition of mixed oxides by controlled reactive magnetron-sputtering from metallic targets

Fundamental understanding and modeling of reactive sputtering processes

S. Berg, Tomas Nyberg · Thin Solid Films · 2005 · 689 citations

Engineering, Industrial Engineering, Process Simulation Model +8

Intrinsic stress in sputter-deposited thin films

H. Windischmann · Critical reviews in solid state and materials sciences/CRC critical reviews in solid state and materials sciences · 1992 · 631 citations

Materials Science, Materials Engineering, Engineering +13

Reactive magnetron sputtering of thin films: present status and trends

J. Musil, Pavel Baroch, J. Vlček et al. · Thin Solid Films · 2004 · 389 citations

Materials Science, Spintronics, Magnetism +12

Pulsed magnetron sputter technology

S. Schiller, K. Goedicke, J. Reschke et al. · Surface and Coatings Technology · 1993 · 334 citations

Magnetism, Engineering, Applied Physics +4

Stress reduction in ion beam sputtered mixed oxide films

B. J. Pond, J. I. DeBar, C. K. Carniglia et al. · Applied Optics · 1989 · 65 citations